| Apparatus |
Specifications [Applications] |
| Scanning electron microscope (SEM) (Hitachi: S-4200) |
magnification: x20-500,000, attachment: pretreatment systems [surface observation] |
| Energy dispersive X-ray micro analyzer (EDX) (Horiba: EMAX-5770) |
detect element: B(Z=5)-U(Z=92), energy resolution: <144eV [micro analysis of chemical elements] |
| Hall effect measurement system (Bio Rad: HL5500S) |
I/V curve, Resistivity, Hall measurement, attachment: LN2 cryostat [measurement of changes of electric properties] |
| X-ray diffractometry (XRD) (Philips: PW3040, PW3050HR) |
scan: 12deg/sec, accuracy: 0.0002deg, attachment: X-ray optics [crystal structure analysis, evaluation of super lattice device] |
| RHEED (Eikou: MB-1000, MY-1000) |
accelerate: 30keV, filament: hairpin type, spot: 90Κm [surface analysis] |
| STM / AFM (Digital Instruments: NanoScope III) |
STM, AFM (contact/ tapping mode, in liquid, phase imaging), etc. [observation of sample surface, cell, etc.] |
| IR spectrophotometer (Nicolet: Magna750, 550) |
750:range: 100-10000cm-1, resolition: 0.09-0.5cm-1, attachment: microscope, /550: range: 350-7400cm-1, resolution: 0.5cm-1 |
| Microscopic FT-IR (Horiba: FT-520) |
range: 700-4000cm-1, resolution: 2cm-1, measurement area:`10Κm2 [IR absorption spectroscopy] |
| UV/VIS spectrophotometer (Hitachi: U-3500) |
range: 187-3200nm, resolution: 0.1nm [measurement of absorption] |
| HPLC (Waters: 626LC system) |
fluence: 0-10.00ml/min (0.01ml/min step), pressure: 0-41MPa [sample separation and analysis] |
| GCMS (Shimadzu: CGMS-QP5000) |
m/z: 10-700, resolution: R+2M, scan speed: 6000AMU/sec [sample separation and mass spectroscopy] |
